Abstract
In this study, the use of focused high-speed air jets to cause removal of particulates from wafer surfaces was investigated. Two sets of experiments were carried out. The first used a continuous air jet, while the second employed a pulsed jet with three different air velocities. The results reveal that particle removal efficiency depends on the frequency of the jet.
Original language | English |
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Pages (from-to) | S537-S538 |
Journal | Journal of Aerosol Science |
Volume | 30 |
Issue number | Suppl. 1 |
DOIs | |
State | Published - 1 Jan 1999 |
Externally published | Yes |
Event | Proceedings of the 1999 European Aerosol Conference - Prague, Czech Republic Duration: 6 Sep 1999 → 10 Sep 1999 |
ASJC Scopus subject areas
- Environmental Engineering
- Pollution
- Mechanical Engineering
- Fluid Flow and Transfer Processes
- Atmospheric Science