PERIODIC PATTERNS AND TECHNIQUE TO CONTROL MISALIGNMENT BETWEEN TWO LAYERS

Ibrahim Abdulhalim (Inventor), Mike Adel (Inventor), Michael Faeyrman (Inventor), Ibrahim Abdulhalim (Inventor), Mike Adel (Inventor), Michael Friedmann (Inventor), Michael Faeyrman (Inventor)

Research output: Patent

Abstract

A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Original languageEnglish
Patent numberUS2018100735
IPCH01L 23/ 544 A I
Priority date30/10/17
StatePublished - 12 Apr 2018

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