Periodic Patterns and Techniques to Control Misalignment Between Two Layers

Ibrahim Abdulhalim; Mike Adel; Michael Friedmann; Michael Faeyrman

Periodic Patterns and Techniques to Control Misalignment Between Two Layers

Ibrahim Abdulhalim (Inventor), Mike Adel (Inventor), Michael Friedmann (Inventor), Michael Faeyrman (Inventor)

Unit of Photonics and Electro-Optics Engineering

Research output: Patent

Abstract

A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

Original language	English
Patent number	US2015300815
IPC	H01L 23/ 544 A I
Priority date	1/07/15
State	Published - 22 Oct 2015

Cite this

@misc{7184ce85b786472bb817786316c44e1a,

title = "Periodic Patterns and Techniques to Control Misalignment Between Two Layers",

abstract = "A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.",

author = "Ibrahim Abdulhalim and Mike Adel and Michael Friedmann and Michael Faeyrman",

year = "2015",

month = oct,

day = "22",

language = "English",

type = "Patent",

note = "US2015300815; H01L 23/ 544 A I",

}

TY - PAT

T1 - Periodic Patterns and Techniques to Control Misalignment Between Two Layers

AU - Abdulhalim, Ibrahim

AU - Adel, Mike

AU - Friedmann, Michael

AU - Faeyrman, Michael

PY - 2015/10/22

Y1 - 2015/10/22

N2 - A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

AB - A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

M3 - Patent

M1 - US2015300815

ER -

Periodic Patterns and Techniques to Control Misalignment Between Two Layers

Abstract

Fingerprint

Cite this