@inproceedings{46d6fac4b2e3415a87881e3cfe024167,
title = "Photoresists based on chalcogenide glasses for submicron lithography",
abstract = "It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.",
author = "I. Bar and M. Klebanov and V. Lyubin and Salman Rosenwaks and S. Shtutina and V. Volterra",
year = "1993",
month = dec,
day = "1",
language = "English",
isbn = "081941218X",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Publ by Society of Photo-Optical Instrumentation Engineers",
pages = "251--257",
editor = "Itzhak Shladov and Yitzhak Weissman and Moshe Oron",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
note = "8th Meeting on Optical Engineering on Israel: Optoelectronics and Applications in Industry and Medicine ; Conference date: 14-12-1992 Through 16-12-1992",
}