Photoresists based on chalcogenide glasses for submicron lithography

I. Bar, M. Klebanov, V. Lyubin, Salman Rosenwaks, S. Shtutina, V. Volterra

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

It is shown that the photosensitivity of photoresists based on chalcogenide glasses can be increased drastically (1000 times and more) using excitation by pulsed radiation of excimer laser. A model is developed that explains the increase in sensitivity. The main advantages of chalcogenide photoresists are discussed and conclusions are drawn on the prospects of these resists for submicron photolithography.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsItzhak Shladov, Yitzhak Weissman, Moshe Oron
PublisherPubl by Society of Photo-Optical Instrumentation Engineers
Pages251-257
Number of pages7
ISBN (Print)081941218X
StatePublished - 1 Dec 1993
Event8th Meeting on Optical Engineering on Israel: Optoelectronics and Applications in Industry and Medicine - Tel Aviv, Isr
Duration: 14 Dec 199216 Dec 1992

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1972
ISSN (Print)0277-786X

Conference

Conference8th Meeting on Optical Engineering on Israel: Optoelectronics and Applications in Industry and Medicine
CityTel Aviv, Isr
Period14/12/9216/12/92

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