Photoresponse of n-ZnO/p-Si heterojunction towards ultraviolet/visible lights: thickness dependent behavior

S. Mridha, M. Dutta, Durga Basak

Research output: Contribution to journalArticlepeer-review

61 Scopus citations

Abstract

A series of n-ZnO/p-Si thin film heterojunctions have been fabricated by a low cost sol-gel technique for different ZnO film thicknesses and the dark as well as photo current-voltage (I-V) characteristics have been investigated in details. The heterojunction with ZnO thickness of 0.46 um shows the best diode characteristics in terms of rectification ratio, I F/I R = 5.7 × 10 3 at 5 V and reverse leakage current density, J R = 7.6 ×10 -5 A cm -2 at -5 V. From the photo I-V curves and wavelength dependent photocurrent of the heterojunctions, it is found that the junction with 0.46 μm ZnO thickness shows the highest sensitivity towards both UV and visible lights.

Original languageEnglish
Pages (from-to)S376-S379
JournalJournal of Materials Science: Materials in Electronics
Volume20
Issue numberSUPPL. 1
DOIs
StatePublished - 1 Jan 2009
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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