Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source

Rotem Kupfer; Hernan J. Quevedo; Herbie L. Smith; Thanh N. Ha; Andrew Yandow; Ganesh Tiwari; C. Grant Richmond; Li Fang; B. Manuel Hegelich

doi:10.1364/AO.58.004592

Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source

Rotem Kupfer, Hernan J. Quevedo, Herbie L. Smith, Thanh N. Ha, Andrew Yandow, Ganesh Tiwari, C. Grant Richmond, Li Fang, B. Manuel Hegelich

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.

Original language	English
Pages (from-to)	4592-4598
Number of pages	7
Journal	Applied Optics
Volume	58
Issue number	17
DOIs	https://doi.org/10.1364/AO.58.004592
State	Published - 10 Jun 2019
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

Access to Document

10.1364/AO.58.004592

Cite this

Kupfer, R., Quevedo, H. J., Smith, H. L., Ha, T. N., Yandow, A., Tiwari, G., Richmond, C. G., Fang, L., & Hegelich, B. M. (2019). Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source. Applied Optics, 58(17), 4592-4598. https://doi.org/10.1364/AO.58.004592

@article{a4fc08d1763242688a3cf2d192251137,

title = "Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source",

abstract = "We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.",

author = "Rotem Kupfer and Quevedo, \{Hernan J.\} and Smith, \{Herbie L.\} and Ha, \{Thanh N.\} and Andrew Yandow and Ganesh Tiwari and Richmond, \{C. Grant\} and Li Fang and Hegelich, \{B. Manuel\}",

note = "Publisher Copyright: {\textcopyright} 2019 Optical Society of America.",

year = "2019",

month = jun,

day = "10",

doi = "10.1364/AO.58.004592",

language = "English",

volume = "58",

pages = "4592--4598",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "17",

}

Kupfer, R, Quevedo, HJ, Smith, HL, Ha, TN, Yandow, A, Tiwari, G, Richmond, CG, Fang, L & Hegelich, BM 2019, 'Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source', Applied Optics, vol. 58, no. 17, pp. 4592-4598. https://doi.org/10.1364/AO.58.004592

TY - JOUR

T1 - Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source

AU - Kupfer, Rotem

AU - Quevedo, Hernan J.

AU - Smith, Herbie L.

AU - Ha, Thanh N.

AU - Yandow, Andrew

AU - Tiwari, Ganesh

AU - Richmond, C. Grant

AU - Fang, Li

AU - Hegelich, B. Manuel

PY - 2019/6/10

Y1 - 2019/6/10

N2 - We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.

AB - We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.

UR - https://www.scopus.com/pages/publications/85066942526

U2 - 10.1364/AO.58.004592

DO - 10.1364/AO.58.004592

M3 - Article

C2 - 31251278

AN - SCOPUS:85066942526

SN - 1559-128X

VL - 58

SP - 4592

EP - 4598

JO - Applied Optics

JF - Applied Optics

IS - 17

ER -

Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this