Plasma fluorination of carbon-based materials for imprint and molding lithographic applications

M. Schvartzman; A. Mathur; J. Hone; C. Jahnes; S. J. Wind

doi:10.1063/1.2944997

Plasma fluorination of carbon-based materials for imprint and molding lithographic applications

M. Schvartzman, A. Mathur, J. Hone, C. Jahnes, S. J. Wind

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

Diamondlike carbon nanoimprint templates are modified by exposure to a fluorocarbon-based plasma, yielding an ultrathin layer of a fluorocarbon material on the surface which has a very low surface energy with excellent antiwear properties. We demonstrate the use of these plasma fluorinated templates to pattern features with dimensions ∼20 nm and below. Furthermore, we show that this process is extendable to other carbon-based materials. Plasma fluorination can be applied directly to nanoimprint resists as well as to molds used to form elastomer stamps for microcontact printing and other applications requiring easy mold release.

Original language	English
Article number	153105
Journal	Applied Physics Letters
Volume	93
Issue number	15
DOIs	https://doi.org/10.1063/1.2944997
State	Published - 24 Oct 2008
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.2944997

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title = "Plasma fluorination of carbon-based materials for imprint and molding lithographic applications",

abstract = "Diamondlike carbon nanoimprint templates are modified by exposure to a fluorocarbon-based plasma, yielding an ultrathin layer of a fluorocarbon material on the surface which has a very low surface energy with excellent antiwear properties. We demonstrate the use of these plasma fluorinated templates to pattern features with dimensions ∼20 nm and below. Furthermore, we show that this process is extendable to other carbon-based materials. Plasma fluorination can be applied directly to nanoimprint resists as well as to molds used to form elastomer stamps for microcontact printing and other applications requiring easy mold release.",

author = "M. Schvartzman and A. Mathur and J. Hone and C. Jahnes and Wind, {S. J.}",

note = "Funding Information: The authors thank Dr. Kateryna Artyushkova at the University of New Mexico for assistance with XPS measurements and analysis. This work was supported by the National Institutes of Health through the NIH Roadmap for Medical Research under Award No. PN2EY016586 and by the National Science Foundation under Award No. NSF EF-05-07086. Additional support from the Nanoscale Science and Engineering Initiative of the National Science Foundation under NSF Award No. CHE-0641523 and by the New York State Office of Science, Technology, and Academic Research (NYSTAR) is also gratefully acknowledged.",

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AU - Schvartzman, M.

AU - Mathur, A.

AU - Hone, J.

AU - Jahnes, C.

AU - Wind, S. J.

N1 - Funding Information: The authors thank Dr. Kateryna Artyushkova at the University of New Mexico for assistance with XPS measurements and analysis. This work was supported by the National Institutes of Health through the NIH Roadmap for Medical Research under Award No. PN2EY016586 and by the National Science Foundation under Award No. NSF EF-05-07086. Additional support from the Nanoscale Science and Engineering Initiative of the National Science Foundation under NSF Award No. CHE-0641523 and by the New York State Office of Science, Technology, and Academic Research (NYSTAR) is also gratefully acknowledged.

PY - 2008/10/24

Y1 - 2008/10/24

N2 - Diamondlike carbon nanoimprint templates are modified by exposure to a fluorocarbon-based plasma, yielding an ultrathin layer of a fluorocarbon material on the surface which has a very low surface energy with excellent antiwear properties. We demonstrate the use of these plasma fluorinated templates to pattern features with dimensions ∼20 nm and below. Furthermore, we show that this process is extendable to other carbon-based materials. Plasma fluorination can be applied directly to nanoimprint resists as well as to molds used to form elastomer stamps for microcontact printing and other applications requiring easy mold release.

AB - Diamondlike carbon nanoimprint templates are modified by exposure to a fluorocarbon-based plasma, yielding an ultrathin layer of a fluorocarbon material on the surface which has a very low surface energy with excellent antiwear properties. We demonstrate the use of these plasma fluorinated templates to pattern features with dimensions ∼20 nm and below. Furthermore, we show that this process is extendable to other carbon-based materials. Plasma fluorination can be applied directly to nanoimprint resists as well as to molds used to form elastomer stamps for microcontact printing and other applications requiring easy mold release.

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Plasma fluorination of carbon-based materials for imprint and molding lithographic applications

Abstract

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