Plasma polymer films for 532 nm laser micromachining

Keyphrases

• 532 Nm Laser 100%
• Plasma Polymer Films 100%
• Laser Micromachining 100%
• Ethylene 40%
• Thick Film 40%
• Micromachining 40%
• Pinhole-free 20%
• Optical Properties 20%
• Physical Properties 20%
• Optical Absorption 20%
• Low Energy 20%
• Molecular Structure 20%
• Mass Flow Rate 20%
• Fully Developed 20%
• Close Proximity 20%
• Group Concentration 20%
• Deposition Rate 20%
• Laser Pulse 20%
• Nd-YAG Laser 20%
• Debris 20%
• Densely Packed 20%
• Substrate Adhesion 20%
• Rounded Corners 20%
• Plasma-polymerized Film 20%
• Plasma Polymerization 20%
• Ultraviolet Exposure 20%
• Application Specific Integrated Circuits 20%
• Free-standing Film 20%
• Frequency Doubling 20%
• Depolymerization 20%
• Plasma Power 20%
• Energy Pulse 20%
• Rapid Drying 20%
• Environmentally Friendly Process 20%

Material Science

• Polymer Films 100%
• Laser Beam Machining 100%
• Film 60%
• Thick Films 40%
• Micromachining 40%
• Physical Property 20%
• Optical Property 20%
• Molecular Structure 20%
• Electronic Circuit 20%
• Laser Pulse 20%
• Plasma Polymerization 20%

Engineering

• Plasma Polymer Film 100%
• Laser Beam Machining 100%
• Micro Machining 40%
• Mass Flowrate 20%
• Close Proximity 20%
• Deposition Rate 20%
• Rounded Corner 20%
• Physical Structure 20%
• Application Specific Integrated Circuit 20%
• Plasma Polymerization 20%
• Optimum Condition 20%