Polarization sensitive printing by ultrafast laser nanostructuring in amorphous silicon

Rokas Drevinskas, Martynas Beresna, Mindaugas Gecevicius, Mark Khenkin, Andrey G. Kazanskii, Oleg I. Konkov, Peter G. Kazansky

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We demonstrate femto- and picosecond laser assisted nanostructuring of hydrogenated amorphous silicon (a-Si:H). The laser-induced periodic sub-wavelength structures exhibit the dichroism and giant form birefringence giving extra dimensions to the polarization sensitive image recording.

Original languageEnglish
Title of host publication2015 Conference on Lasers and Electro-Optics, CLEO 2015
PublisherInstitute of Electrical and Electronics Engineers
ISBN (Electronic)9781557529688
StatePublished - 10 Aug 2015
Externally publishedYes
EventConference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States
Duration: 10 May 201515 May 2015

Publication series

NameConference on Lasers and Electro-Optics Europe - Technical Digest
Volume2015-August

Conference

ConferenceConference on Lasers and Electro-Optics, CLEO 2015
Country/TerritoryUnited States
CitySan Jose
Period10/05/1515/05/15

Keywords

  • Optical films
  • Optical imaging
  • Optical polarization
  • Optical pulses
  • Optical sensors
  • Ultrafast optics

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Fingerprint

Dive into the research topics of 'Polarization sensitive printing by ultrafast laser nanostructuring in amorphous silicon'. Together they form a unique fingerprint.

Cite this