@inproceedings{4f9d0b7992cd43c8aa28df52290d258b,
title = "Proposed approach to drive wafer topography for advanced lithography",
abstract = "One requirement for advanced lithography remains suitable incoming wafer topography. We propose that local wafer flatness be visualized and quantified using the techniques developed for wafer front-surface nanotopography. This is a significant change in that existing wafer topography metrology tools do not enable our proposed approach.",
keywords = "Flatness, Nanotopography, Wafer",
author = "Valley, \{John F.\} and Andrey Melnikov and Pitney, \{John A.\}",
note = "Publisher Copyright: {\textcopyright} 2016 SPIE.; 30th Conference on Metrology, Inspection, and Process Control for Microlithography ; Conference date: 22-02-2016 Through 25-02-2016",
year = "2016",
month = jan,
day = "1",
doi = "10.1117/12.2214627",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sanchez, \{Martha I.\} and Ukraintsev, \{Vladimir A.\}",
booktitle = "Metrology, Inspection, and Process Control for Microlithography XXX",
address = "United States",
}