Pyrometric temperature control system for microwave processing of materials

E. Pert, J. P. Calame, D. Gershon, Y. Carmel

Research output: Contribution to journalConference articlepeer-review

Abstract

Accurate temperature measurements and uniform processing of a material with microwaves can be difficult with thermocouples that perturb the electromagnetic field. Arcing and field intensification is particularly a problem with low loss materials that do not couple well. Optical pyrometers offer a non-invasive alternative, but are generally restricted to surface temperature measurements and are usually nonlinear over the temperature range of interest. Improved accuracy over the entire range of interest is possible with an integrated approach using a pc to calibrate the pyrometer against a thermocouple reference. A pyrometer-retrofitted microwave processing system that can measure and control from 40 °C to 1600 °C is presented.

Original languageEnglish
Pages (from-to)209
Number of pages1
JournalIEEE International Conference on Plasma Science
StatePublished - 1 Jan 1998
Externally publishedYes
EventProceedings of the 1998 IEEE International Conference on Plasma Science - Raleigh, NC, USA
Duration: 1 Jun 19984 Jun 1998

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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