Abstract
A di-vacancy low-temperature diffusion is proposed to explain diffusion-controlled processes in Al-Si alloys responsible for neutron-induced silicon precipitation. Ab initio calculations of potential barriers for Si atom hopping in aluminium lattice showed that in the case of di-vacancy diffusion, they are small compared with that of mono-vacancy diffusion. The low temperature diffusivity of mono-vacancies is too small to account for the measured Si diffusivities in aluminium. The dependencies of radiation-stimulated diffusion on the neutron flux and on the temperature are obtained and can be used for the experimental verification of the developed model.
| Original language | English |
|---|---|
| Pages (from-to) | 59-67 |
| Number of pages | 9 |
| Journal | Radiation Effects and Defects in Solids |
| Volume | 162 |
| Issue number | 2 |
| DOIs | |
| State | Published - 1 Feb 2007 |
Keywords
- Di-vacancy diffusion
- Neutron-stimulated diffusion
ASJC Scopus subject areas
- Radiation
- Nuclear and High Energy Physics
- General Materials Science
- Condensed Matter Physics