Simulation of interfacial metal electrodeposition: The electrochemical model and the numerical implementation

Vassili S. Sochnikov, Shlomo Efrima

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

We present a detailed physical and numerical model describing electrochemical behavior, aimed eventually at following the shape evolution in interracial growth (electrodeposition in particular). Details of the numerical implementation are outlined, followed by a few telling examples of the electrochemical behavior at thin disk electrodes and at thick cylindrical electrodes. We demonstrate the large effect that radial mass transport has in the case of practically stationary thin electrodes, and the unusual behavior of propagating thin electrodes.

Original languageEnglish
Pages (from-to)11993-11999
Number of pages7
JournalJournal of Physical Chemistry B
Volume106
Issue number46
DOIs
StatePublished - 21 Nov 2002

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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