Simulations of initial stages of boron deposition on (1 1 0) tungsten surface

Simon Dorfman, Ronan R. Braga, Kleber C. Mundim, David Fuks

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations


Non-empirical potentials are employed in atomistic simulations of the deposition process of boron on tungsten (110) surface in the framework of the generalized simulation annealing formalism. A comparative analysis of the fine atomic structure in the vicinity of the surface clears up the behavior of the system in the simulated deposition process. Existence of a number of energy barriers in the adhesion path of the boron atom demonstrates the dependence of adhesion conditions on the energy of the atom approaching the surface. This result also shows that the conditions of the metalloid adhesion are influenced by the directional bonding nature and the structural reconstruction of the substrate surface.

Original languageEnglish
Pages (from-to)676-682
Number of pages7
JournalSurface Science
Issue number1-3 PART 2
StatePublished - 20 Sep 2004
EventProceedings of the 22nd European Conference on Surface Science - Prague, Czech Republic
Duration: 7 Sep 200312 Sep 2003


  • Adhesion
  • Adsorption kinetics
  • Boron
  • Monte Carlo simulations
  • Tungsten

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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