Abstract
Design and performance of a 128×128 snap-shot imager implemented in a standard single-poly CMOS technology is presented. A new pixel design and clocking scheme allow the imager to provide high-quality images without motion artifacts at high shutter speeds (<75 μsec. exposure), with low noise (<5 e-), immeasurable image lag, and excellent blooming protection.
Original language | English |
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Pages (from-to) | 45-48 |
Number of pages | 4 |
Journal | Technical Digest - International Electron Devices Meeting |
State | Published - 1 Dec 1998 |
Externally published | Yes |
Event | Proceedings of the 1998 IEEE International Electron Devices Meeting - San Francisco, CA, USA Duration: 6 Dec 1998 → 9 Dec 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry