Soft-substrate rigid-feature (SSRF) mold for nanoimprint lithography

Liran Menachem, Mark Schvartzman

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


In this work, we introduce a novel concept of hybrid nano-imprint mold based on a soft substrate with rigid relief features. Our approach combines the advantages of soft and rigid molding approaches, and at the same time overcomes their drawbacks. Specifically, this mold provides a unique combination of: (1) High pattern fidelity and small feature size as offered by hard molds and (2) low sensitivity to defects and ability to pattern curved substrates as offered by soft molds. The SSRF mold was fabricated by electron-beam lithography of Hydrogen Silsesquioxane (HSQ) on a sacrificial substrate, followed by transferring the obtained HSQ features to elastomeric PDMS substrate. The pattern replication was demonstrated on nano imprint of UV-curable resist.

Original languageEnglish
Title of host publicationNanophotonic Materials XIII
EditorsGilles Lerondel, Taleb Mokari, Adam M. Schwartzberg, Stefano Cabrini
ISBN (Electronic)9781510602298
StatePublished - 1 Jan 2016
EventNanophotonic Materials XIII - San Diego, United States
Duration: 30 Aug 201631 Aug 2016

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceNanophotonic Materials XIII
Country/TerritoryUnited States
CitySan Diego

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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