Spectroscopic interference microscopy technique for measurement of layer parameters

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

A novel method is proposed for the measurement of layer parameters using spectroscopic double-beam interference microscopy. The contribution of each partial wave reflected from the layer interfaces to the interferogram is treated separately and the total interferogram is obtained as their coherent sum. When an annulus aperture is used, an analytic expression is derived for the interferogram that allows fast direct comparison between measured and calculated spectra from which refractive indices and thickness of layers can be determined simultaneously. Subnanometre accuracy of the film thickness measurement is shown to be possible.

Original languageEnglish
Pages (from-to)1996-2001
Number of pages6
JournalMeasurement Science and Technology
Volume12
Issue number11
DOIs
StatePublished - 1 Jan 2001
Externally publishedYes

Keywords

  • Interference microscopy
  • Multi-layers
  • Optical metrology
  • Thin film optics

ASJC Scopus subject areas

  • Instrumentation
  • Engineering (miscellaneous)
  • Applied Mathematics

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