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Stacking faults in silicon epitaxial layers
H. Aharoni
Department of Electrical & Computer Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
5
Scopus citations
Overview
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Keyphrases
Stacking Faults
100%
Silicon Epitaxial Layers
100%
Growth Process
40%
Epitaxial Layers
30%
Foreign Material
30%
Reactor
20%
Silicon Substrate
20%
Crystal Orientation
10%
Defect Formation
10%
Optical Microscope
10%
Layer Growth
10%
Appropriate Treatment
10%
Crystal Plane
10%
Equilateral Triangle
10%
Substrate Surface
10%
Chemical Etching
10%
Interface Region
10%
Geometrical Forms
10%
Mechanical Polishing
10%
Substrate Layer
10%
Epitaxial Layer Thickness
10%
Chemical Polishing
10%
(111) Silicon
10%
Engineering
Epitaxial Layer
100%
Growth Process
66%
Surface Layer
50%
Foreign Material
50%
Silicon Substrate
33%
Defects
33%
Layer Thickness
16%
Experimental Result
16%
Optical Microscope
16%
Substrate Surface
16%
Major Part
16%
Mechanical Polishing
16%
Chemical Polishing
16%
Material Science
Silicon
100%
Epitaxial Layer
100%
Stacking Fault
100%
Nucleation
10%
Polishing
10%