Standard CMOS fabrication of a sensitive fully depleted electrolyte-insulator-semiconductor field effect transistor for biosensor applications

Gil Shalev, Ariel Cohen, Amihood Doron, Andrew Machauf, Moran Horesh, Udi Virobnik, Daniela Ullien, Ilan Levy

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

Microfabricated semiconductor devices are becoming increasingly relevant for detection of biological and chemical components. The integration of active biological materials together with sensitive transducers offers the possibility of generating highly sensitive, specific, selective and reliable biosensors. This paper presents the fabrication of a sensitive, fully depleted (FD), electrolyte-insulator-semiconductor field-effect transistor (EISFET) made with a silicon-on-insulator (SOI) wafer of a thin 10-30 nm active SOI layer. Initial results are presented for device operation in solutions and for bio-sensing. Here we report the first step towards a high volume manufacturing of a CMOS-based biosensor that will enable various types of applications including medical and enviro nmental sensing.

Original languageEnglish
Pages (from-to)4366-4379
Number of pages14
JournalSensors
Volume9
Issue number6
DOIs
StatePublished - 1 Jun 2009
Externally publishedYes

Keywords

  • Biosensors
  • CMOS
  • EISFET
  • Fully depleted

ASJC Scopus subject areas

  • Analytical Chemistry
  • Information Systems
  • Atomic and Molecular Physics, and Optics
  • Biochemistry
  • Instrumentation
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Standard CMOS fabrication of a sensitive fully depleted electrolyte-insulator-semiconductor field effect transistor for biosensor applications'. Together they form a unique fingerprint.

Cite this