Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance

E. Rozenberg; D. Mogilaynski; J. Pelleg; G. Gorodetsky; R. Somekh

doi:10.1016/S0040-6090(98)01484-9

Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance

E. Rozenberg, D. Mogilaynski, J. Pelleg, G. Gorodetsky, R. Somekh

Department of Physics

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

X-ray diffraction and simulation of the data were used to characterize simultaneously sputtered specimens of Co/Cu multilayers. It is shown that a simple geometrical factor, namely, the difference in the mean distance between the sputtering targets and the samples leads to noticeable changes in magnetoresistance due to variations in the structural parameters. The variations, especially the enhanced interfacial roughness of the Co layers, may induce contacts between neighboring Co layers that decrease drastically the absolute value of the magnetoresistance.

Original language	English
Pages (from-to)	11-14
Number of pages	4
Journal	Thin Solid Films
Volume	342
Issue number	1
DOIs	https://doi.org/10.1016/S0040-6090(98)01484-9
State	Published - 26 Mar 1999

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance",

abstract = "X-ray diffraction and simulation of the data were used to characterize simultaneously sputtered specimens of Co/Cu multilayers. It is shown that a simple geometrical factor, namely, the difference in the mean distance between the sputtering targets and the samples leads to noticeable changes in magnetoresistance due to variations in the structural parameters. The variations, especially the enhanced interfacial roughness of the Co layers, may induce contacts between neighboring Co layers that decrease drastically the absolute value of the magnetoresistance.",

author = "E. Rozenberg and D. Mogilaynski and J. Pelleg and G. Gorodetsky and R. Somekh",

note = "Funding Information: This research was supported by the Israeli Science Foundation administered by the Israel Academy of Sciences and Humanities and the Ministry of Science and Arts under Grants no 169/95-3 and no 6203396, respectively. One of the authors (J.P.) acknowledges the financial support of the Sam Ayrton Chair in Metallurgy.",

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T1 - Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance

AU - Rozenberg, E.

AU - Mogilaynski, D.

AU - Pelleg, J.

AU - Gorodetsky, G.

AU - Somekh, R.

N1 - Funding Information: This research was supported by the Israeli Science Foundation administered by the Israel Academy of Sciences and Humanities and the Ministry of Science and Arts under Grants no 169/95-3 and no 6203396, respectively. One of the authors (J.P.) acknowledges the financial support of the Sam Ayrton Chair in Metallurgy.

PY - 1999/3/26

Y1 - 1999/3/26

N2 - X-ray diffraction and simulation of the data were used to characterize simultaneously sputtered specimens of Co/Cu multilayers. It is shown that a simple geometrical factor, namely, the difference in the mean distance between the sputtering targets and the samples leads to noticeable changes in magnetoresistance due to variations in the structural parameters. The variations, especially the enhanced interfacial roughness of the Co layers, may induce contacts between neighboring Co layers that decrease drastically the absolute value of the magnetoresistance.

AB - X-ray diffraction and simulation of the data were used to characterize simultaneously sputtered specimens of Co/Cu multilayers. It is shown that a simple geometrical factor, namely, the difference in the mean distance between the sputtering targets and the samples leads to noticeable changes in magnetoresistance due to variations in the structural parameters. The variations, especially the enhanced interfacial roughness of the Co layers, may induce contacts between neighboring Co layers that decrease drastically the absolute value of the magnetoresistance.

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Structural and magnetoresistive properties of sputtered Co/Cu multilayers in the vicinity of the first maximum of magnetoresistance

Abstract

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