The structure and stability of ultra-thin TaNxfilms deposited using atomic layer deposition (ALD) technique, were investigated. The Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were used for the study of the deposited films. The TaNx ultra-thin films were found to be nanocrystalline with an fcc NaCl-structure. It was also observed that Ta atoms in the films were strongly bonded with their surrounding N atoms in an ionic type.
ASJC Scopus subject areas
- General Physics and Astronomy