Substrate-temperature dependent structure and composition variations in RF magnetron sputtered titanium nitride thin films

K. Vasu, M. Ghanashyam Krishna, K. A. Padmanabhan

Research output: Contribution to journalArticlepeer-review

52 Scopus citations

Abstract

Using RF reactive magnetron sputtering process in a 100% nitrogen atmosphere, TiN x thin films were deposited on a quartz substrate. The crystal structure and optical properties of the as-deposited thin films, as a function of substrate temperature, were studied. From room temperature till 600 °C, with increasing temperature, the crystal structure changed from tetragonal to cubic, with 'x' in TiN x increasing with the substrate temperature. In the entire temperature range x was less than 1. Simultaneously, the optical plasma band of the film shifted from the ultra-violet region having energy of 4.83 eV to the visible region corresponding to energy of 2.47 eV. The width of the transmittance band in the visible range varied with temperature between 460 nm and 620 nm. All the films exhibited a PL (photoluminescent) single band in the middle of the visible region.

Original languageEnglish
Pages (from-to)3069-3074
Number of pages6
JournalApplied Surface Science
Volume257
Issue number7
DOIs
StatePublished - 1 Jan 2011
Externally publishedYes

Keywords

  • Magnetron sputtering
  • Optical properties
  • Stoichiometry
  • Thin films
  • Titanium nitride

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • General Physics and Astronomy
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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