Abstract
The effect of residual hydrogen, sorbed during the deposition process, on the hydrogenation behavior of ion-beam sputtered titanium thin films was investigated. Electromotive force and in situ stress measurements were conducted to study hydrogen absorption, phase boundaries and hydrogen-induced stress development in the Ti-H thin film system. Tests were conducted on both as-sputtered and previously discharged films; the effect of residual hydrogen is significantly manifested in the thermodynamic isotherms and stress-concentration curves.
| Original language | English |
|---|---|
| Pages (from-to) | 709-712 |
| Number of pages | 4 |
| Journal | Scripta Materialia |
| Volume | 62 |
| Issue number | 9 |
| DOIs | |
| State | Published - 1 May 2010 |
| Externally published | Yes |
Keywords
- Hydrogen
- Sputtering
- Stress
- Thin films
- Titanium
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering
- Metals and Alloys