The effect of the rate of deposition on superconductive properties and structure of tin films

T. Janatuinen, G. Jung, E. Mizera

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The effect of the real rate of deposition on the superconducting properties and structure of tin films deposited in vacuum on room-temperature amorphous substrates has been observed and studied for rates in the 5-200 AA s -1 range. It is suggested that the oxygen contamination coefficient K, and thus film purity, changes with the rate of deposition. At higher rates, above 100 AA s-1, pure smooth films were obtained, suitable for the fabrication of superconducting tunnel junctions.

Original languageEnglish
Article number020
Pages (from-to)1781-1785
Number of pages5
JournalJournal Physics D: Applied Physics
Volume12
Issue number10
DOIs
StatePublished - 1 Dec 1979
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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