The initial interactions of beryllium with O2 and H2O vapor at elevated temperatures

S. Zalkind, M. Polak, N. Shamir

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

In the 310-790 K temperature range, the mechanism of initial oxidation by O2 is oxide island nucleation and growth. At the lower temperature range, oxygen is first chemisorbed and the oxide nucleates at coverage of ∼0.2. Increasing the temperature causes the oxide islands to nucleate at lower coverage and at 700 K and above, the oxide nucleates without any significant stage of chemisorbed oxygen. The temperature dependence shows that while the dissociation stage is not activated, the oxide nucleation and growth are thermally activated. Also, opposite to O2 adsorption, the initial H2O adsorption and oxidation rate was found to decrease with temperature. Opposite to the oxygen case, upon exposure to water vapor there is no noticeable stage of chemisorbed oxygen (or OH) and oxide is directly nucleated. Only after oxide coalescence, this tendency changes and the oxidation rate is increased with temperature.

Original languageEnglish
Pages (from-to)1326-1332
Number of pages7
JournalSurface Science
Volume601
Issue number5
DOIs
StatePublished - 1 Mar 2007

Keywords

  • Adsorption kinetics
  • Auger electron spectroscopy
  • Beryllium
  • Ion scattering spectroscopy
  • Oxidation

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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