The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates

E. A. Kotomin; V. N. Kuzovkov; G. Zvejnieks; Yu Zhukovskii; D. Fuks; S. Dorfman; A. M. Stoneham

doi:10.1016/S0038-1098(02)00907-9

The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates

E. A. Kotomin, V. N. Kuzovkov, G. Zvejnieks, Yu Zhukovskii, D. Fuks, S. Dorfman, A. M. Stoneham

Department of Materials Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

The results of kinetic MC simulations of the reversible pattern formation during the adsorption of mobile metal atoms on crystalline substrates are discussed. Pattern formation, simulated for submonolayer metal coverage, is characterized in terms of the joint correlation functions for a spatial distribution of adsorbed atoms. A wide range of situations, from the almost irreversible to strongly reversible regimes, is simulated. We demonstrate that the patterns obtained are defined by a key dimensionless parameter: the ratio of the mutual attraction energy between atoms to the substrate temperature. Our ab initio calculations for the nearest Ag-Ag adsorbate atom interaction on an MgO substrate give an attraction energy as large as 1.6eV, close to that in a free molecule. This is in contrast to the small Ag adhesion and migration energies (0.23 and 0.05eV, respectively) on a defect-free MgO substrate.

Original language	English
Pages (from-to)	463-467
Number of pages	5
Journal	Solid State Communications
Volume	125
Issue number	9
DOIs	https://doi.org/10.1016/S0038-1098(02)00907-9
State	Published - 1 Mar 2003

Keywords

A. Surfaces and interfaces
B. Crystal growth
D. Kinetic properties

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Materials Chemistry

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10.1016/S0038-1098(02)00907-9

Cite this

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title = "The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates",

abstract = "The results of kinetic MC simulations of the reversible pattern formation during the adsorption of mobile metal atoms on crystalline substrates are discussed. Pattern formation, simulated for submonolayer metal coverage, is characterized in terms of the joint correlation functions for a spatial distribution of adsorbed atoms. A wide range of situations, from the almost irreversible to strongly reversible regimes, is simulated. We demonstrate that the patterns obtained are defined by a key dimensionless parameter: the ratio of the mutual attraction energy between atoms to the substrate temperature. Our ab initio calculations for the nearest Ag-Ag adsorbate atom interaction on an MgO substrate give an attraction energy as large as 1.6eV, close to that in a free molecule. This is in contrast to the small Ag adhesion and migration energies (0.23 and 0.05eV, respectively) on a defect-free MgO substrate.",

keywords = "A. Surfaces and interfaces, B. Crystal growth, D. Kinetic properties",

author = "Kotomin, {E. A.} and Kuzovkov, {V. N.} and G. Zvejnieks and Yu Zhukovskii and D. Fuks and S. Dorfman and Stoneham, {A. M.}",

note = "Funding Information: We would like to thank K. Kern for many stimulating discussions. The authors acknowledge financial support from the Deutsche Forschungsgemeinschaft via fellowships for V.K. Part of this work was supported by the Fonds der Chemischen Industrie and the European Center of Excellence for Advanced Materials Research and Technology in Riga, Latvia (Contract No. ICA-1-CT-2000-7007). ",

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doi = "10.1016/S0038-1098(02)00907-9",

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T1 - The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates

AU - Kotomin, E. A.

AU - Kuzovkov, V. N.

AU - Zvejnieks, G.

AU - Zhukovskii, Yu

AU - Fuks, D.

AU - Dorfman, S.

AU - Stoneham, A. M.

N1 - Funding Information: We would like to thank K. Kern for many stimulating discussions. The authors acknowledge financial support from the Deutsche Forschungsgemeinschaft via fellowships for V.K. Part of this work was supported by the Fonds der Chemischen Industrie and the European Center of Excellence for Advanced Materials Research and Technology in Riga, Latvia (Contract No. ICA-1-CT-2000-7007).

PY - 2003/3/1

Y1 - 2003/3/1

N2 - The results of kinetic MC simulations of the reversible pattern formation during the adsorption of mobile metal atoms on crystalline substrates are discussed. Pattern formation, simulated for submonolayer metal coverage, is characterized in terms of the joint correlation functions for a spatial distribution of adsorbed atoms. A wide range of situations, from the almost irreversible to strongly reversible regimes, is simulated. We demonstrate that the patterns obtained are defined by a key dimensionless parameter: the ratio of the mutual attraction energy between atoms to the substrate temperature. Our ab initio calculations for the nearest Ag-Ag adsorbate atom interaction on an MgO substrate give an attraction energy as large as 1.6eV, close to that in a free molecule. This is in contrast to the small Ag adhesion and migration energies (0.23 and 0.05eV, respectively) on a defect-free MgO substrate.

AB - The results of kinetic MC simulations of the reversible pattern formation during the adsorption of mobile metal atoms on crystalline substrates are discussed. Pattern formation, simulated for submonolayer metal coverage, is characterized in terms of the joint correlation functions for a spatial distribution of adsorbed atoms. A wide range of situations, from the almost irreversible to strongly reversible regimes, is simulated. We demonstrate that the patterns obtained are defined by a key dimensionless parameter: the ratio of the mutual attraction energy between atoms to the substrate temperature. Our ab initio calculations for the nearest Ag-Ag adsorbate atom interaction on an MgO substrate give an attraction energy as large as 1.6eV, close to that in a free molecule. This is in contrast to the small Ag adhesion and migration energies (0.23 and 0.05eV, respectively) on a defect-free MgO substrate.

KW - A. Surfaces and interfaces

KW - B. Crystal growth

KW - D. Kinetic properties

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U2 - 10.1016/S0038-1098(02)00907-9

DO - 10.1016/S0038-1098(02)00907-9

M3 - Article

AN - SCOPUS:0037362369

SN - 0038-1098

VL - 125

SP - 463

EP - 467

JO - Solid State Communications

JF - Solid State Communications

IS - 9

ER -

The kinetic MC modelling of reversible pattern formation in initial stages of thin metallic film growth on crystalline substrates

Abstract

Keywords

ASJC Scopus subject areas

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