The role of electric field during spray deposition on fluorine doped tin oxide film

Anuj Kumar; Sanjay Kumar Swami; Viresh Dutta

doi:10.1016/j.jallcom.2013.11.130

The role of electric field during spray deposition on fluorine doped tin oxide film

Anuj Kumar, Sanjay Kumar Swami, Viresh Dutta

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

The fluorine doped tin oxide film has been deposited on 10 cm × 10 cm glass substrate by using spray technique with a voltage applied between the nozzle and an annular electrode placed 2 mm below the nozzle. The effect of the electric field thus created during the spray deposition on structural, optical and electrical properties of SnO₂:F (FTO) film was studied. X-ray diffraction pattern revealed the presence of cassiterite structure with (2 0 0) orientation for all the FTO film. SEM study revealed the formation of smooth and uniform surface FTO film under the electric field over the entire substrate area. The electrical measurements show that the film prepared under the electric field (for an applied voltage of 2000 V) had a resistivity ∼1.2 × 10^-3 Ω cm, carrier concentration ∼4.21 × 10²⁰ cm^-3 and mobility ∼14.48 cm ² V^-1 s^-1. The sprayed FTO film have the average transmission in the visible region of more than about 80%.

Original language	English
Pages (from-to)	546-550
Number of pages	5
Journal	Journal of Alloys and Compounds
Volume	588
DOIs	https://doi.org/10.1016/j.jallcom.2013.11.130
State	Published - 5 Mar 2014
Externally published	Yes

Keywords

Electric field
Spray process
Transparent conducting oxide

ASJC Scopus subject areas

Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

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10.1016/j.jallcom.2013.11.130

Cite this

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title = "The role of electric field during spray deposition on fluorine doped tin oxide film",

abstract = "The fluorine doped tin oxide film has been deposited on 10 cm × 10 cm glass substrate by using spray technique with a voltage applied between the nozzle and an annular electrode placed 2 mm below the nozzle. The effect of the electric field thus created during the spray deposition on structural, optical and electrical properties of SnO2:F (FTO) film was studied. X-ray diffraction pattern revealed the presence of cassiterite structure with (2 0 0) orientation for all the FTO film. SEM study revealed the formation of smooth and uniform surface FTO film under the electric field over the entire substrate area. The electrical measurements show that the film prepared under the electric field (for an applied voltage of 2000 V) had a resistivity ∼1.2 × 10-3 Ω cm, carrier concentration ∼4.21 × 1020 cm-3 and mobility ∼14.48 cm 2 V-1 s-1. The sprayed FTO film have the average transmission in the visible region of more than about 80%.",

keywords = "Electric field, Spray process, Transparent conducting oxide",

author = "Anuj Kumar and Swami, {Sanjay Kumar} and Viresh Dutta",

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doi = "10.1016/j.jallcom.2013.11.130",

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journal = "Journal of Alloys and Compounds",

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publisher = "Elsevier B.V.",

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T1 - The role of electric field during spray deposition on fluorine doped tin oxide film

AU - Kumar, Anuj

AU - Swami, Sanjay Kumar

AU - Dutta, Viresh

PY - 2014/3/5

Y1 - 2014/3/5

N2 - The fluorine doped tin oxide film has been deposited on 10 cm × 10 cm glass substrate by using spray technique with a voltage applied between the nozzle and an annular electrode placed 2 mm below the nozzle. The effect of the electric field thus created during the spray deposition on structural, optical and electrical properties of SnO2:F (FTO) film was studied. X-ray diffraction pattern revealed the presence of cassiterite structure with (2 0 0) orientation for all the FTO film. SEM study revealed the formation of smooth and uniform surface FTO film under the electric field over the entire substrate area. The electrical measurements show that the film prepared under the electric field (for an applied voltage of 2000 V) had a resistivity ∼1.2 × 10-3 Ω cm, carrier concentration ∼4.21 × 1020 cm-3 and mobility ∼14.48 cm 2 V-1 s-1. The sprayed FTO film have the average transmission in the visible region of more than about 80%.

AB - The fluorine doped tin oxide film has been deposited on 10 cm × 10 cm glass substrate by using spray technique with a voltage applied between the nozzle and an annular electrode placed 2 mm below the nozzle. The effect of the electric field thus created during the spray deposition on structural, optical and electrical properties of SnO2:F (FTO) film was studied. X-ray diffraction pattern revealed the presence of cassiterite structure with (2 0 0) orientation for all the FTO film. SEM study revealed the formation of smooth and uniform surface FTO film under the electric field over the entire substrate area. The electrical measurements show that the film prepared under the electric field (for an applied voltage of 2000 V) had a resistivity ∼1.2 × 10-3 Ω cm, carrier concentration ∼4.21 × 1020 cm-3 and mobility ∼14.48 cm 2 V-1 s-1. The sprayed FTO film have the average transmission in the visible region of more than about 80%.

KW - Electric field

KW - Spray process

KW - Transparent conducting oxide

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JO - Journal of Alloys and Compounds

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ER -

The role of electric field during spray deposition on fluorine doped tin oxide film

Abstract

Keywords

ASJC Scopus subject areas

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