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Thermal stability of Re Schottky contacts to 6H-SiC
I. Shalish
, Yoram Shapira
Research output
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Contribution to journal
›
Article
›
peer-review
15
Scopus citations
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Dive into the research topics of 'Thermal stability of Re Schottky contacts to 6H-SiC'. Together they form a unique fingerprint.
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Keyphrases
Annealing
100%
Thermal Stability
100%
6H-SiC
100%
Schottky Contact
100%
Depth Profile
66%
Schottky Barrier
66%
Backscatter
33%
Sputter-deposited
33%
Thermodynamic Stability
33%
Schottky Barrier Height
33%
Backscattering Spectrometry
33%
SiC Substrate
33%
Ideality Factor
33%
Current-voltage (I-V) Characteristics
33%
Forward Current
33%
Sputter Damage
33%
Material Science
Thermal Stability
100%
Schottky Barrier
100%
Film
50%
Annealing
25%
Current-Voltage Characteristic
25%
Engineering
Schottky Barrier
100%
Depth Profile
50%
Current-Voltage Characteristic
25%
Thermodynamic Stability
25%
Ideality Factor
25%
Barrier Height
25%