Thin films of mesoporous silica: Preparation and characterization

S. Pevzner; O. Regev; R. Yerushalmi-Rozen

doi:10.1016/S1359-0294(00)00018-2

Thin films of mesoporous silica: Preparation and characterization

Department of Chemical Engineering

Research output: Contribution to journal › Article › peer-review

56 Scopus citations

Abstract

Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetrics, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital. (C) 2000 Elsevier Science Ltd. All rights reserved.

Original language	English
Pages (from-to)	420-427
Number of pages	8
Journal	Current Opinion in Colloid and Interface Science
Volume	4
Issue number	6
DOIs	https://doi.org/10.1016/S1359-0294(00)00018-2
State	Published - 1 Dec 1999

Keywords

MCM
Mesoporous
Thin films

ASJC Scopus subject areas

Surfaces and Interfaces
Physical and Theoretical Chemistry
Polymers and Plastics
Colloid and Surface Chemistry

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10.1016/S1359-0294(00)00018-2

Cite this

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abstract = "Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetrics, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital. (C) 2000 Elsevier Science Ltd. All rights reserved.",

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Y1 - 1999/12/1

N2 - Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetrics, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital. (C) 2000 Elsevier Science Ltd. All rights reserved.

AB - Preparation of mesoporous materials in a thin film geometry was first reported in 1996. Recently, improvement of the preparation methods yielded stable films with well-defined symmetrics, controlled pore orientation, continuity and film thickness. The ability to tailor film properties is important for their utilization in applications ranging from catalysis to microelectronics, where morphological control in the meso-domain is vital. (C) 2000 Elsevier Science Ltd. All rights reserved.

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KW - Mesoporous

KW - Thin films

UR - https://www.scopus.com/pages/publications/0033366805

U2 - 10.1016/S1359-0294(00)00018-2

DO - 10.1016/S1359-0294(00)00018-2

M3 - Article

AN - SCOPUS:0033366805

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ER -

Thin films of mesoporous silica: Preparation and characterization

Abstract

Keywords

ASJC Scopus subject areas

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