@article{e1f3762db3e142879578be5dbe60399f,
title = "Undesirable contamination in rf sputtered α-Si layers",
abstract = "Undesirable contamination in rf sputtered α-Si thin layers are detected by using a sensitive electron microprobe. Their presence is attributed to residual gases in the sputtering chamber. The residual contents in the chamber are identified by in situ mass spectrometry. Partial correlation is found between the gas phase residual impurities, and contamination in the solid α-Si layers.",
author = "H. Aharoni and PL Swart",
note = "Funding Information: The authors would like to expresst heir thanks to Mr J Markgraaff from the Department of Geology at RAU for his contribution in the electron microprobe measurements,a nd to Dr J Thirlwall of the Materials Characterisation Division, NPRL, CSIR, Pretoria, for the SEM pictures. Useful discussions with Dr K Swancpoel of RAU are also gratefully acknowledged. The authors wish to acknowledge the financial assistanceo f the Cooperative Scientific Programs and the University Kesearch Division of the CSIR, Pretoria.",
year = "1983",
month = jan,
day = "1",
doi = "10.1016/0042-207X(83)90058-1",
language = "English",
volume = "33",
pages = "221--224",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Ltd.",
number = "4",
}