Vacuum-deposited gold films. I. Factors affecting the film morphology

Yuval Golan, Lev Margulis, Israel Rubinstein

Research output: Contribution to journalArticlepeer-review

186 Scopus citations


Thin (300-1000 Å) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering or evaporation. The films were characterized by transmission electron microscopy (TEM), electron diffraction (ED) and voltammetric measurements. Gold sputtering produces pebble-type structures with very small grains and no crystallographic texture. Evaporation of gold onto glass or mica produces large, flat crystallites, with a pronounced {111} texture, while on smooth silicon (100) it results in non-textured films. Annealing of the films at 250°C always has the effect of grain enlargement, and, in the case of gold on glass or mica, enhancement of the {111} texture.

Original languageEnglish
Pages (from-to)312-326
Number of pages15
JournalSurface Science
Issue number3
StatePublished - 15 Mar 1992
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


Dive into the research topics of 'Vacuum-deposited gold films. I. Factors affecting the film morphology'. Together they form a unique fingerprint.

Cite this