Vacuum-deposited gold films. I. Factors affecting the film morphology

Yuval Golan, Lev Margulis, Israel Rubinstein

Research output: Contribution to journalArticlepeer-review

181 Scopus citations

Abstract

Thin (300-1000 Å) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering or evaporation. The films were characterized by transmission electron microscopy (TEM), electron diffraction (ED) and voltammetric measurements. Gold sputtering produces pebble-type structures with very small grains and no crystallographic texture. Evaporation of gold onto glass or mica produces large, flat crystallites, with a pronounced {111} texture, while on smooth silicon (100) it results in non-textured films. Annealing of the films at 250°C always has the effect of grain enlargement, and, in the case of gold on glass or mica, enhancement of the {111} texture.

Original languageEnglish
Pages (from-to)312-326
Number of pages15
JournalSurface Science
Volume264
Issue number3
DOIs
StatePublished - 15 Mar 1992
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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