Van der Waals stable thin liquid films: Correlated undulations and ultimate dewetting

T. Kerle; R. Yerushalmi-Rozen; J. Klein; L. J. Fetters

doi:10.1209/epl/i1998-00498-4

Van der Waals stable thin liquid films: Correlated undulations and ultimate dewetting

T. Kerle, R. Yerushalmi-Rozen, J. Klein, L. J. Fetters

Department of Chemical Engineering

Research output: Contribution to journal › Article › peer-review

38 Scopus citations

Abstract

The evolution of pre-rupture undulations at the liquid-air interface of thin non-wetting liquid films spread on a solid substrate was monitored in real time by non-perturbative interference microscopy. The spatial distribution of the incipient undulations is non-random and characterized by a typical wavelength, as predicted for van der Waals unstable films, despite the fact that the system is expected to be vdW-stable, and that ultimate dewetting of films appears to take place via a heterogeneous nucleation mechanism.

Original language	English
Pages (from-to)	484-490
Number of pages	7
Journal	EPL
Volume	44
Issue number	4
DOIs	https://doi.org/10.1209/epl/i1998-00498-4
State	Published - 15 Nov 1998

ASJC Scopus subject areas

Physics and Astronomy (all)

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abstract = "The evolution of pre-rupture undulations at the liquid-air interface of thin non-wetting liquid films spread on a solid substrate was monitored in real time by non-perturbative interference microscopy. The spatial distribution of the incipient undulations is non-random and characterized by a typical wavelength, as predicted for van der Waals unstable films, despite the fact that the system is expected to be vdW-stable, and that ultimate dewetting of films appears to take place via a heterogeneous nucleation mechanism.",

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AU - Klein, J.

AU - Fetters, L. J.

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AB - The evolution of pre-rupture undulations at the liquid-air interface of thin non-wetting liquid films spread on a solid substrate was monitored in real time by non-perturbative interference microscopy. The spatial distribution of the incipient undulations is non-random and characterized by a typical wavelength, as predicted for van der Waals unstable films, despite the fact that the system is expected to be vdW-stable, and that ultimate dewetting of films appears to take place via a heterogeneous nucleation mechanism.

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DO - 10.1209/epl/i1998-00498-4

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Van der Waals stable thin liquid films: Correlated undulations and ultimate dewetting

Abstract

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