Water chemisorption on a sputter deposited uranium dioxide film - Effect of defects

Keyphrases

• Hydroxyl 100%
• Uranium Dioxide 100%
• Sputter-deposited 100%
• Defect Effect 100%
• Film Effect 100%
• Water Chemisorption 100%
• Temperature Range 50%
• Spectrometry 50%
• X-ray Photoelectron Spectroscopy 50%
• Water Vapor 50%
• Adsorption Rate 50%
• Complex Behavior 50%
• Chemisorption 50%
• Surface Coverage 50%
• Coverage Rate 50%
• Dissociative Adsorption 50%
• Surface Defects 50%
• Surface Adsorption 50%
• Healing Effect 50%
• Deposition Methods 50%
• Water Dissociation 50%
• Defect Sites 50%
• OH Bond 50%
• Dense Clusters 50%
• Modified Waters 50%
• Thin Film Surfaces 50%
• Reactive Sputter Deposition 50%
• Temperature Dependence 50%

Chemistry

• Chemisorption 100%
• Uranium Dioxide 100%
• Hydroxyl 50%
• Chemical Kinetics Characteristics 25%
• Water Vapor 25%
• Dissociative Chemisorption 25%
• Deposition Technique 25%
• Diffuse Reflectance Spectroscopy 25%
• X Ray Photoemission Spectroscopy 25%
• Surface Defect 25%
• Sputter Deposition 25%
• Water Dissociation 25%

Chemical Engineering

• Uranium Dioxide 100%
• Film 100%
• Chemisorption 100%
• Spectrometry 25%
• Sputter Deposition 25%
• Chemical Kinetics Characteristics 25%