ZnO nanostructure thin films by continuous spray pyrolysis using doped precursor for Si solar cell application

Hrishikesh Dhasmana, Shilpi Shital, V. Dutta

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

This work presents deposition of Zn solution seed layer assisted growth of zinc oxide (ZnO) nanostructure layers by continuous spray pyrolysis reactor using lanthanides (Er and Eu) and metal (Al) influenced zinc acetate precursor solution. Dopants in precursors have influenced structural property, surface morphology and optical reflectance of resulting ZnO thin films which are supported by X-ray diffractometer, scanning electron microscope and reflectance measurements. Enhanced dispersion amongst nanorods is observed under the influence of Er and Al dopant in ZnO thin film. The change of precursor from Zinc acetate to Titanium tetraisopropoxide for Er doped precursor is helping to achieve better crystalline ZnO nanorods arrangement with increased homogenous growth, which results into improved light reflectance reduction of thin film. The experimental evidences of light reflectance from ZnO nanorods on Si surface is studied with the help of FDTD based Lumerical software package which can be a useful study for designing ZnO nanorods thin film in device purposes. The utility of ZnO layer by this reactor on low efficiency Si solar cell is also explored in improving device efficiency via increase of photocurrent.

Original languageEnglish
Pages (from-to)4095-4102
Number of pages8
JournalJournal of Materials Science: Materials in Electronics
Volume25
Issue number9
DOIs
StatePublished - 1 Jan 2014
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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